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Deposition of Cr-Si thin films by reactive plasmatron-magnetron sputtering

✍ Scribed by G. Sobe; H. Schreiber; G. Weise; R. Voigtmann; G. Zies; J. Sonntag; W. Brückner; R. Grötzschel

No coin nor oath required. For personal study only.

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