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Optical properties of ZnO thin films deposited by dc reactive magnetron sputtering

✍ Scribed by Li-jian Meng; M Andritschky; MP dos Santos

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
526 KB
Volume
44
Category
Article
ISSN
0042-207X

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## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had