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Low-temperature Surface Passivation of Moderately Doped Crystalline Silicon by Atomic-layer-deposited Hafnium Oxide Films

✍ Scribed by F. Lin; B. Hoex; Y.H. Koh; J.J. Lin; A.G. Aberle

Book ID: 116426543
Publisher: Elsevier
Year: 2012
Weight: 578 KB
Volume: 15
Category: Article
ISSN: 1876-6102
DOI: 10.1016/j.egypro.2012.02.010

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