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Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon

✍ Scribed by Kalkofen, Bodo; Amusan, Akinwumi A.; Lisker, Marco; Burte, Edmund P.

Book ID: 120467822
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 445 KB
Volume: 109
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2013.03.073

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