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Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes

✍ Scribed by L. Hiltunen; H. Kattelus; M. Leskelä; M. Mäkelä; L. Niinistö; E. Nykänen; P. Soininen; M. Tiittad

No coin nor oath required. For personal study only.

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