Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH 2 Cl 2 and O 3 as the Precursors

✍ Scribed by Lee, Joo-Hyeon; Kim, Un-Jung; Han, Chang-Hee; Rha, Sa-Kyun; Lee, Won-Jun; Park, Chong-Ook

• Book ID: 125465092
• Publisher: Institute of Pure and Applied Physics
• Year: 2004
• Tongue: English
• Weight: 113 KB
• Volume: 43
• Category: Article
• ISSN: 0021-4922
• DOI: 10.1143/jjap.43.l328