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Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH 2 Cl 2 and O 3

✍ Scribed by Lee, Won-Jun; Han, Chang-Hee; Park, Jae-Kyun; Lee, Youn-Seoung; Rha, Sa-Kyun

Book ID: 120309907
Publisher: Institute of Pure and Applied Physics
Year: 2010
Tongue: English
Weight: 168 KB
Volume: 49
Category: Article
ISSN: 0021-4922
DOI: 10.1143/JJAP.49.071504

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