✦ LIBER ✦

Thermal properties of thin Al2O3 films and their barrier layer effect on thermo-optic properties of TiO2 films grown by atomic layer deposition

✍ Scribed by Saleem, Muhammad Rizwan; Ali, Rizwan; Honkanen, Seppo; Turunen, Jari

Book ID: 125471249
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 597 KB
Volume: 542
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2013.06.030

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Optical properties of Al_2O_3 thin films

Optical properties of Al_2O_3 thin films grown by atomic layer deposition

✍ Kumar, Pradeep ;Wiedmann, Monika K. ;Winter, Charles H. ;Avrutsky, Ivan 📂 Article 📅 2009 🏛 The Optical Society 🌐 English ⚖ 865 KB

Thermal properties of TiO2 films grown b

Thermal properties of TiO2 films grown by atomic layer deposition

✍ M.R. Saleem; P. Silfsten; S. Honkanen; J. Turunen 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 660 KB

Atomic layer deposition of TiO 2 and Al

Atomic layer deposition of TiO 2 and Al 2 O 3 thin films and nanolaminates

✍ Mitchell, D R G; Triani, G; Attard, D J; Finnie, K S; Evans, P J; Barbé, C J; Ba 📂 Article 📅 2005 🏛 Institute of Physics 🌐 English ⚖ 438 KB

Effects of annealing temperature and Al2

Effects of annealing temperature and Al2O3 buffer layer on ZnO thin films grown by atomic layer deposition

✍ C.R. Kim; J.Y. Lee; J.H. Heo; C.M. Shin; T.M. Lee; J.H. Park; H. Ryu; J.H. Chang 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 370 KB

Effect of nitrogen doping concentration

Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition

✍ Hsyi-En Cheng; Yu-Ru Chen; Wen-Tuan Wu; Ching-Ming Hsu 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 579 KB

Properties of Al2O3-films deposited on s

Properties of Al2O3-films deposited on silicon by atomic layer epitaxy

✍ Per Ericsson; Stefan Bengtsson; Jarmo Skarp 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 293 KB

A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900°C resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i