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Atomic Layer Deposition of Silicon Oxide Thin Films by Alternating Exposures to Si[sub 2]Cl[sub 6] and O[sub 3]

✍ Scribed by Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun

Book ID: 125433153
Publisher: The Electrochemical Society
Year: 2008
Tongue: English
Weight: 429 KB
Volume: 11
Category: Article
ISSN: 1099-0062
DOI: 10.1149/1.2908201

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