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Atomic layer epitaxy growth of aluminum oxide thin films from a novel Al(CH[sub 3])[sub 2]Cl precursor and H[sub 2]O

✍ Scribed by Kukli, Kaupo

Book ID: 127180589
Publisher: AVS (American Vacuum Society)
Year: 1997
Tongue: English
Weight: 393 KB
Volume: 15
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.580536

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