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Self-limiting atomic-layer deposition of Si on SiO[sub 2] by alternate supply of Si[sub 2]H[sub 6] and SiCl[sub 4]

✍ Scribed by Yokoyama, Shin; Ohba, Kenji; Nakajima, Anri

Book ID: 120974739
Publisher: American Institute of Physics
Year: 2001
Tongue: English
Weight: 311 KB
Volume: 79
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.1389508

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