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Morphological and optical properties of Si nanostructures imbedded in SiO[sub 2] and Si[sub 3]N[sub 4] films grown by single source chemical vapor deposition

✍ Scribed by Torrison, L.; Tolle, J.; Smith, David J.; Poweleit, C.; Menendez, J.; Mitan, M. M.; Alford, T. L.; Kouvetakis, J.

Book ID: 120401956
Publisher: American Institute of Physics
Year: 2002
Tongue: English
Weight: 673 KB
Volume: 92
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.1525046

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