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Structural and electrical properties of low pressure metalorganic chemical vapor deposition grown Eu[sub 2]O[sub 3] films on Si(100)

✍ Scribed by Singh, M. P.; Shalini, K.; Shivashankar, S. A.; Deepak, G. C.; Bhat, N.

Book ID: 121512140
Publisher: American Institute of Physics
Year: 2006
Tongue: English
Weight: 313 KB
Volume: 89
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2388128

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