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Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al[sub 2]O[sub 3] thin films on Si(100)

✍ Scribed by Klein, T. M.; Niu, D.; Epling, W. S.; Li, W.; Maher, D. M.; Hobbs, C. C.; Hegde, R. I.; Baumvol, I. J. R.; Parsons, G. N.

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