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Structural and electrical properties of Al2O3 thin films on p-Si grown by low-pressure metalorganic chemical vapor deposition

✍ Scribed by T.W. Kim; S.S. Yom; W.N. Kang; Y.S. Yoon; Chayeon Kim; Sungtae Kim; I.S. Yang; Y.J. Wee

No coin nor oath required. For personal study only.

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