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Atomic Layer Deposition of Hafnium Silicate from HfCl[sub 4], SiCl[sub 4], and H[sub 2]O

✍ Scribed by Fedorenko, Y.; Swerts, J.; Maes, J. W.; Tois, E.; Haukka, S.; Wang, C.-G.; Wilk, G.; Delabie, A.; Deweerd, W.; De Gendt, S.

Book ID: 125470142
Publisher: The Electrochemical Society
Year: 2007
Tongue: English
Weight: 175 KB
Volume: 10
Category: Article
ISSN: 1099-0062
DOI: 10.1149/1.2712051

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