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SiO[sub 2] Chemical Vapor Deposition at Room Temperature Using SiCl[sub 4] and H[sub 2]O with an NH[sub 3] Catalyst

✍ Scribed by Klaus, J. W.; George, S. M.


Book ID
121414422
Publisher
The Electrochemical Society
Year
2000
Tongue
English
Weight
379 KB
Volume
147
Category
Article
ISSN
0013-4651

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