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Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

✍ Scribed by Seguini, G.; Cianci, E.; Wiemer, C.; Saynova, D.; van Roosmalen, J. A. M.; Perego, M.

Book ID: 120432795
Publisher: American Institute of Physics
Year: 2013
Tongue: English
Weight: 834 KB
Volume: 102
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.4800541

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