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Limiting factors in sub-10ânm scanning-electron-beam lithography

✍ Scribed by Cord, Bryan; Yang, Joel; Duan, Huigao; Joy, David C.; Klingfus, Joseph; Berggren, Karl K.

Book ID: 121288468
Publisher: AVS (American Vacuum Society)
Year: 2009
Tongue: English
Weight: 720 KB
Volume: 27
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.3253603

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Limiting factors in sub-10ânm scanning-electron-beam lithography

Limiting factors in sub-10ânm scanning-electron-beam lithography