✦ LIBER ✦
Sub-10 nm monogranular metallic lines formed by 200 kV electron-beam lithography and lift-off in polymethylmethacrylate resist
✍ Scribed by C. Vieu; M. Mejias; F. Carcenac; G. Faini; H. Launois
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 332 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0167-9317
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