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Guided Formation of a Sub-10 nm Silicide Dot Array on an Area Patterned by Electron-Beam Lithography

✍ Scribed by J.-S. Wi; T.-Y. Lee; H.-M. Kim; H.-S. Lee; S. -W. Nam; I. J. Shin; K. H. Shin; K.-B. Kim


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
689 KB
Volume
19
Category
Article
ISSN
0935-9648

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