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10 nm electron beam lithography and sub-50 nm overlay using a modified scanning electron microscope

✍ Scribed by Fischer, P. B.; Chou, S. Y.

Book ID: 120360295
Publisher: American Institute of Physics
Year: 1993
Tongue: English
Weight: 658 KB
Volume: 62
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.109166

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