✦ LIBER ✦

Fabrication of sub-10-nm Au–Pd structures using 30 keV electron beam lithography and lift-off

✍ Scribed by F Lehmann; G Richter; T Borzenko; V Hock; G Schmidt; L.W Molenkamp

Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 494 KB
Volume: 65
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00963-2

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✦ Synopsis

We report the fabrication of 6-nm Au-Pd structures using 30-keV e-beam lithography in a standard double-layer poly(methylmethacrylate) resist on silicon and subsequent lift-off. Line arrays with periods as small as 27 nm were realized. Details of the processing are presented and the dependence of the resolution on the different resist layer thicknesses is discussed.