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[Japan Soc. Applied Phys 2003 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (10-12 June 2003)] 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) - Low-energy nitrogen plasmas for 65-nm node oxynitride gate dielectrics: a correlation of plasma characteristics and device parameters

✍ Scribed by Kraus, P.A.; Ahmed, K.; Chua, T.C.; Ershov, M.; Karbasi, H.; Olsen, C.S.; Nouri, F.; Holland, J.; Zhao, R.; Miner, G.; Lepert, A.

Book ID: 123617743
Publisher: Japan Soc. Applied Phys
Year: 2003
Tongue: Japanese
Weight: 172 KB
Category: Article
ISBN-13: 9784891140335
DOI: 10.1109/VLSIT.2003.1221126

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