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[Japan Soc. Applied Phys 2003 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (10-12 June 2003)] 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) - Novel Co/Ni bi-layer salicidation for 45 nm gate technology

โœ Scribed by Wang, M.Y.; Chang, C.W.; Wu, C.M.; Lin, C.T.; Hsieh, C.H.; Shue, W.S.; Liang, M.S.

Book ID
126624215
Publisher
Japan Soc. Applied Phys
Year
2003
Weight
209 KB
Category
Article
ISBN-13
9784891140335

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