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Isolation design comparisons for 0.5 μm CMOS technology using SILO process

✍ Scribed by G. Guegan; S. Deleonibus; M. Lerme; J.P. Blanc

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
298 KB
Volume
19
Category
Article
ISSN
0167-9317

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