Optimisation of isolation for 0.5 μm CMOS technology using SILO process with R.T.N. of silicon

✍ Scribed by G. Guegan; S. Deleonibus; M. Lerme; G. Reimbold; P. Molle

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 173 KB
• Volume: 15
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90302-t