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Investigation of gate leakage mechanism in Al2O3/Al0.55Ga0.45N/GaN metal-oxide-semiconductor high-electron-mobility transistors

โœ Scribed by Zhu, Jie-Jie; Ma, Xiao-Hua; Hou, Bin; Chen, Wei-Wei; Hao, Yue


Book ID
127260966
Publisher
American Institute of Physics
Year
2014
Tongue
English
Weight
813 KB
Volume
104
Category
Article
ISSN
0003-6951

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