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GaN metal-oxide-semiconductor high-electron-mobility-transistor with atomic layer deposited Al2O3 as gate dielectric

✍ Scribed by Ye, P. D.; Yang, B.; Ng, K. K.; Bude, J.; Wilk, G. D.; Halder, S.; Hwang, J. C. M.


Book ID
118259532
Publisher
American Institute of Physics
Year
2005
Tongue
English
Weight
533 KB
Volume
86
Category
Article
ISSN
0003-6951

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