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A Simple Gate-Dielectric Fabrication Process for AlGaN/GaN Metal–Oxide–Semiconductor High-Electron-Mobility Transistors

✍ Scribed by Liu, Han-Yin; Chou, Bo-Yi; Hsu, Wei-Chou; Lee, Ching-Sung; Ho, Chiu-Sheng

Book ID
120091830
Publisher
IEEE
Year
2012
Tongue
English
Weight
407 KB
Volume
33
Category
Article
ISSN
0741-3106

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