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Electrical characteristics of AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor using La2O3gate dielectric

✍ Scribed by Qian Feng, Qiang Wang, Tao Xing, Qian Li, Yue Hao


Book ID
120799390
Publisher
SP Science China Press
Year
2013
Tongue
English
Weight
493 KB
Volume
56
Category
Article
ISSN
1006-9321

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Fabrication of AlGaN/GaN double-insulato
✍ Balachander, Krishnan ;Arulkumaran, Subramaniam ;Sano, Y. ;Egawa, Takashi ;Baska πŸ“‚ Article πŸ“… 2005 πŸ› John Wiley and Sons 🌐 English βš– 164 KB

## Abstract We report on the fabrication of AlGaN/GaN double‐insulator MOSHEMTs using SiO~2~ and SiN as the prime gate insulators. Both the dielectrics showed enhanced saturation current density and pinch‐off voltage compared to conventional HEMTs. The SiO~2~/SiN/AlGaN/GaN MOSHEMTs exhibited a low