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Influence of deposition parameters on preferred orientation of RF magnetron sputtered BST thin films

✍ Scribed by Songzhan Li; Yanqin Yang; L. Liu; T. J. Zhang; W. H. Huang


Publisher
Springer US
Year
2007
Tongue
English
Weight
207 KB
Volume
19
Category
Article
ISSN
0957-4522

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore