In this work we report on the results obtained on NbN x thin films grown on both common glass and silicon wafer substrates by RF magnetron sputtering at different substrate temperatures and different target power supplies. The crystalinity, morphology and surface composition of the deposited films h
✦ LIBER ✦
Optimisation of the deposition and annealing parameters of paraelectric PLZT (28100) thin films grown by RF magnetron sputtering
✍ Scribed by B. Jaber; D. Rémiens; E. Cattan; B. Thierry
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 455 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0924-4247
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