Crystallographic structure and surface composition of thin films grown by RF magnetron sputtering
β Scribed by J.E. Alfonso; J. Buitrago; J. Torres; B. Santos; J.F. Marco
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 177 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0026-2692
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β¦ Synopsis
In this work we report on the results obtained on NbN x thin films grown on both common glass and silicon wafer substrates by RF magnetron sputtering at different substrate temperatures and different target power supplies. The crystalinity, morphology and surface composition of the deposited films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS), respectively.
π SIMILAR VOLUMES
TiO 2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline