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Substrate-temperature dependent structure and composition variations in RF magnetron sputtered titanium nitride thin films

✍ Scribed by K. Vasu; M. Ghanashyam Krishna; K.A. Padmanabhan


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
764 KB
Volume
257
Category
Article
ISSN
0169-4332

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Within the frame of this work, low temperature Ti-Si-C films were deposited on high-speed steel and stainless steel substrates by combined dc/rf magnetron co-sputtering. Composition analysis revealed the existence of two distinct regions: (i) a silicon doped sub-stoichiometric titanium carbide zone