𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Structure and photo-induced features of TiO2 thin films prepared by RF magnetron sputtering

✍ Scribed by Xiu-Tian Zhao; Kenji Sakka; Naoto Kihara; Yasuyuki Takada; Makoto Arita; Masataka Masuda

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
118 KB
Volume
36
Category
Article
ISSN
0026-2692

No coin nor oath required. For personal study only.

✦ Synopsis

TiO 2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO 2 thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.

πŸ“œ SIMILAR VOLUMES

Photo-induced hydrophilic properties of
Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films
✍ Junjie Xiong; Sachindra Nath Das; Sungyeon Kim; Jinhyong Lim; Hyun Choi; Jae-Min πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 576 KB

## Photo-induced hydrophilic Oxygen flow ratio Self cleaning TiO 2 thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1 mTorr) and various O 2 and Ar flow ratios (R O2 = O 2 /(O 2 + Ar)). Properties of TiO 2 films were measured by field

Deposition of Ag nanostructures on TiO2
Deposition of Ag nanostructures on TiO2 thin films by RF magnetron sputtering
✍ J. Zuo πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 587 KB

Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore

CdS Thin Films Prepared by RF Magnetron
CdS Thin Films Prepared by RF Magnetron Sputtering in Ar Atmosphere
✍ Punnoose, A. ;Marafi, M. ;Prabu, G. ;El-Akkad, F. πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 162 KB πŸ‘ 2 views

CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the h100i direction. The increase of dep