Deposition of Ag nanostructures on TiO2 thin films by RF magnetron sputtering

✍ Scribed by J. Zuo

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 587 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2010.05.034

✦ Synopsis

Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailored by careful variation of the deposition parameters. Controllable clusterlike, islandlike and film Ag structures on TiO 2 film were obtained, respectively. DC potential was found as an appropriate parameter to tailor the change of Ag nanostructure and the overall Ag amount. The compositions, nanostructures and morphologies of nanocomposite films appreciably influence the optical response.