Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore
โฆ LIBER โฆ
Characterization of TiO2/Au/TiO2 films deposited by magnetron sputtering on polycarbonate substrates
โ Scribed by Daeil Kim
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 336 KB
- Volume
- 257
- Category
- Article
- ISSN
- 0169-4332
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