๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Photocatalytic activity of dc magnetron sputter deposited amorphous TiO2 thin films

โœ Scribed by K. Eufinger; D. Poelman; H. Poelman; R. De Gryse; G.B. Marin


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
319 KB
Volume
254
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Structural characterization of DC magnet
โœ B. Karunagaran; R.T. Rajendra Kumar; V. Senthil Kumar; D. Mangalaraj; Sa.K. Nara ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 293 KB

Titanium dioxide films have been deposited using DC magnetron sputtering technique onto well-cleaned p-silicon substrates at an oxygen partial pressure of 7 ร‚ 10 -5 mbar and at a sputtering pressure (Ar+O 2 ) of 1 ร‚ 10 -3 mbar. The deposited films were calcinated at 673 and 773 K. The composition of