Photocatalytic property of TiO2 thin films sputtered-deposited on unheated substrates
โ Scribed by Y. Pihosh; M. Goto; A. Kasahara; M. Tosa
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 390 KB
- Volume
- 256
- Category
- Article
- ISSN
- 0169-4332
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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 ยฐC. The str
Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore