Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore
β¦ LIBER β¦
Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering
β Scribed by Xu Wenbin; Dong Shurong; Wang Demiao; Ren Gaochao
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 308 KB
- Volume
- 403
- Category
- Article
- ISSN
- 0921-4526
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