Structural and optical properties of N-doped β-Ga2O3 films deposited by RF magnetron sputtering
✍ Scribed by Yijun Zhang; Jinliang Yan; Qingshan Li; Chong Qu; Liying Zhang; Ting Li
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 930 KB
- Volume
- 406
- Category
- Article
- ISSN
- 0921-4526
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✦ Synopsis
The N-doped b-Ga 2 O 3 films were grown on Si and quartz substrates by RF magnetron sputtering in different ammonia partial pressure ratios (from 0% to 30%). The influence of ammonia partial pressure ratios and annealing treatment on the optical and structural properties were studied. The microstructure, optical transmittance, optical absorption and optical energy gap of the N-doped b-Ga 2 O 3 films are significantly changed with the increasing of ammonia partial pressure. The green, blue and ultraviolet emission bands are observed and discussed.
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The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos