Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering

✍ Scribed by Ying Zhou; Donghong Gu; Yongyou Geng; Fuxi Gan

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 330 KB
• Volume: 135
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2006.08.046

✦ Synopsis

The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decomposition temperature of the as-deposited NiO x thin films was at about 263 • C. After annealed at 400 • C for 30 min in air, the surface morphology of the films became very rough due to the decomposition of the Ni 2 O 3 , leading to the changes of the optical properties of the NiO x thin films. The reflectivity of the films annealed at 400 • C was lower than that of the as-deposited one and the optical contrast was 52% at 405 nm.