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Optical properties of textured V2O5/Si thin films deposited by reactive magnetron sputtering

✍ Scribed by V.V. Atuchin; B.M. Ayupov; V.A. Kochubey; L.D. Pokrovsky; C.V. Ramana; Yu.M. Rumiantsev

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
318 KB
Volume
30
Category
Article
ISSN
0925-3467

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The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos