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Effect of annealing on electrical resistivity of rf-magnetron sputtered nanostructured SnO2 thin films

โœ Scribed by Abdul Faheem Khan; M. Mehmood; A.M. Rana; M.T. Bhatti

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
330 KB
Volume
255
Category
Article
ISSN
0169-4332

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore