Effect of environment and heat treatment on the optical properties of RF-sputtered SnO2 thin films
β Scribed by S. Saipriya; M. Sultan; R. Singh
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 957 KB
- Volume
- 406
- Category
- Article
- ISSN
- 0921-4526
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10^β4^ mbar. The films were annealed in air for an hour in the
TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 Β°C. The str