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Influence of boron doping on roughness microcrystalline silicon

✍ Scribed by T. Toyama; W. Yoshida; Y. Sobajima; H. Okamoto

Book ID
116671007
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
513 KB
Volume
354
Category
Article
ISSN
0022-3093

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## Abstract A series of hydrogenated silicon (Si:H) thin films of about 350 nm in thickness were fabricated on K9 glass substrate by plasma enhanced chemical vapor deposition. The transition between hydrogenated amorphous silicon (a‐Si:H) and microcrystalline hydrogenated silicon (ΞΌc‐Si:H) was char