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InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts and of 370 GHz

✍ Scribed by Yuanzheng Yue; Zongyang Hu; Jia Guo; Sensale-Rodriguez, B.; Guowang Li; Ronghua Wang; Faria, F.; Tian Fang; Bo Song; Xiang Gao; Shiping Guo; Kosel, T.; Snider, G.; Fay, P.; Jena, D.; Huili Xing


Book ID
115484246
Publisher
IEEE
Year
2012
Tongue
English
Weight
463 KB
Volume
33
Category
Article
ISSN
0741-3106

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Metal-face InAlN/AlN/GaN high electron m
✍ Guo, Jia ;Cao, Yu ;Lian, Chuanxin ;Zimmermann, Tom ;Li, Guowang ;Verma, Jai ;Gao πŸ“‚ Article πŸ“… 2011 πŸ› John Wiley and Sons 🌐 English βš– 307 KB

## Abstract Ohmic regrowth by molecular beam epitaxy (MBE) has been investigated for metal‐face InAlN/AlN/GaN high electron mobility transistors (HEMTs) for the first time. Using SiO~2~ mask n^+^‐GaN was regrown in the source/drain region while deposition on the mask was lifted off in buffered HF a