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In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al[sub 2]O[sub 3]

✍ Scribed by Heil, S. B. S.; Kudlacek, P.; Langereis, E.; Engeln, R.; van de Sanden, M. C. M.; Kessels, W. M. M.


Book ID
127116561
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
415 KB
Volume
89
Category
Article
ISSN
0003-6951

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