Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO[sub 2]

✍ Scribed by Triyoso, D.; Liu, R.; Roan, D.; Ramon, M.; Edwards, N. V.; Gregory, R.; Werho, D.; Kulik, J.; Tam, G.; Irwin, E.; Wang, X.-D.; La, L. B.; Hobbs, C.; Garcia, R.; Baker, J.; White, B. E.; Tobin, P.

• Book ID: 121454228
• Publisher: The Electrochemical Society
• Year: 2004
• Tongue: English
• Weight: 811 KB
• Volume: 151
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.1784821